Invention Grant
US09543167B2 FinFET source-drain merged by silicide-based material 有权
FinFET源极 - 漏极由硅化物材料合并

FinFET source-drain merged by silicide-based material
Abstract:
A method includes conducting a laser-based anneal treatment on a metal layer positioned above and in direct contact with a first diamond shaped epitaxial layer surrounding a first fin and a second diamond shaped epitaxial layer surrounding a second fin, the metal layer extends from the first diamond shaped epitaxial layer to the second diamond shaped epitaxial layer, the laser-based anneal treatment forms a silicide layer, a portion of the silicide layer between the first and the second diamond shaped epitaxial layers is substantially thicker than a portion of the silicide layer in contact with the first and the second diamond shaped epitaxial layers, and the silicide layer takes on a crystal orientation of the first and the second epitaxial layers.
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