Invention Grant
- Patent Title: FinFET source-drain merged by silicide-based material
- Patent Title (中): FinFET源极 - 漏极由硅化物材料合并
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Application No.: US14331267Application Date: 2014-07-15
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Publication No.: US09543167B2Publication Date: 2017-01-10
- Inventor: Brent A. Anderson , Nicolas Breil , Christian Lavoie
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Hoffman Warnick, LLC
- Agent Yuanmin Cai
- Main IPC: H01L21/268
- IPC: H01L21/268 ; H01L21/324 ; H01L29/04 ; H01L29/16 ; H01L29/08 ; H01L29/45 ; H01L21/285 ; H01L21/321 ; H01L21/8234

Abstract:
A method includes conducting a laser-based anneal treatment on a metal layer positioned above and in direct contact with a first diamond shaped epitaxial layer surrounding a first fin and a second diamond shaped epitaxial layer surrounding a second fin, the metal layer extends from the first diamond shaped epitaxial layer to the second diamond shaped epitaxial layer, the laser-based anneal treatment forms a silicide layer, a portion of the silicide layer between the first and the second diamond shaped epitaxial layers is substantially thicker than a portion of the silicide layer in contact with the first and the second diamond shaped epitaxial layers, and the silicide layer takes on a crystal orientation of the first and the second epitaxial layers.
Public/Granted literature
- US20160020208A1 FINFET SOURCE-DRAIN MERGED BY SILICIDE-BASED MATERIAL Public/Granted day:2016-01-21
Information query
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