Invention Grant
US09548161B2 Dielectric thin film element, antifuse element, and method of producing dielectric thin film element
有权
电介质薄膜元件,反熔丝元件以及制造电介质薄膜元件的方法
- Patent Title: Dielectric thin film element, antifuse element, and method of producing dielectric thin film element
- Patent Title (中): 电介质薄膜元件,反熔丝元件以及制造电介质薄膜元件的方法
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Application No.: US15073914Application Date: 2016-03-18
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Publication No.: US09548161B2Publication Date: 2017-01-17
- Inventor: Toshiyuki Nakaiso , Yutaka Takeshima , Yutaka Ishiura , Yuji Irie , Shinsuke Tani , Jun Takagi
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Nagaokakyo-Shi, Kyoto-Fu
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Nagaokakyo-Shi, Kyoto-Fu
- Agency: Arent Fox LLP
- Priority: JP2010-204668 20100913
- Main IPC: H01G4/30
- IPC: H01G4/30 ; H01G4/33 ; H01L23/528 ; H01L23/532 ; H01L23/522 ; H01L23/525 ; H01L27/01

Abstract:
A dielectric thin film element having a high humidity resistance is provided. A dielectric thin film element includes a capacitance section having a dielectric layer and a pair of electrode layers formed on the respective upper and lower surfaces of the dielectric layer. Furthermore, a protection layer is provided on the capacitance section, a pair of interconnect layers are drawn out to an upper surface of the protection layer, and external electrodes are formed to be electrically connected to the interconnect layers. Further, first surface metal layers cover a portion of the interconnect layers that extends along the inner surface of the openings and second surface metal layers are formed at end of the first surface metal layers.
Public/Granted literature
- US20160204063A1 DIELECTRIC THIN FILM ELEMENT, ANTIFUSE ELEMENT, AND METHOD OF PRODUCING DIELECTRIC THIN FILM ELEMENT Public/Granted day:2016-07-14
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