Invention Grant
- Patent Title: Nonvolatile memory device and an erasing method thereof
- Patent Title (中): 非易失性存储器件及其擦除方法
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Application No.: US14887454Application Date: 2015-10-20
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Publication No.: US09558834B2Publication Date: 2017-01-31
- Inventor: Byeong-In Choe , Mincheol Park , Dongseog Eun , Eunsuk Cho
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2014-0155560 20141110
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G11C16/14 ; G11C7/04 ; G11C16/32

Abstract:
An erase method of a nonvolatile memory device includes applying an erase voltage to a substrate; sensing a temperature of a memory cell array; setting a delay time based on the temperature of the memory cell array, wherein the delay time starts in response to the erase voltage being applied to the substrate; applying a ground voltage to a ground selection line connected to a ground selection transistor during the delay time; and increasing a voltage of the ground selection line after the delay time.
Public/Granted literature
- US20160133330A1 NONVOLATILE MEMORY DEVICE AND AN ERASING METHOD THEREOF Public/Granted day:2016-05-12
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