Invention Grant
- Patent Title: Salt and photoresist composition comprising the same
- Patent Title (中): 包含其的盐和光致抗蚀剂组合物
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Application No.: US14601825Application Date: 2015-01-21
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Publication No.: US09562032B2Publication Date: 2017-02-07
- Inventor: Tatsuro Masuyama , Koji Ichikawa , Masafumi Yoshida
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-011112 20140124
- Main IPC: C07D317/72
- IPC: C07D317/72 ; C07D319/08 ; C07D327/04 ; C07D327/06 ; G03F7/039 ; G03F7/20 ; C07C381/12 ; G03F7/004
Abstract:
A salt which has a group represented by formula (a): wherein Xa and Xb each independently represent an oxygen atom or a sulfur group; X1 represents a C1-C12 divalent saturated hydrocarbon group which has a hydroxy group; and * represents a binding site.
Public/Granted literature
- US20150212407A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME Public/Granted day:2015-07-30
Information query
