Invention Grant
- Patent Title: Liquid processing apparatus and liquid processing method
- Patent Title (中): 液体处理装置和液体处理方法
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Application No.: US14065784Application Date: 2013-10-29
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Publication No.: US09564347B2Publication Date: 2017-02-07
- Inventor: Yoshifumi Amano , Satoshi Kaneko
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Burr & Brown, PLLC
- Priority: JP2008-148163 20080605; JP2008-148175 20080605
- Main IPC: H01L21/67
- IPC: H01L21/67

Abstract:
A liquid processing apparatus including: a second housing; a first housing capable of being brought into contact with the second housing; a holding part configured to hold an object to be processed; a rotation driving part configured to rotate the object to be processed held by the holding part; front-side process-liquid supply nozzle configured to supply a process liquid onto a peripheral portion of a front surface of the object to be processed held by the holding part; and a storage part disposed on a side of a rear surface of the object to be processed held by the holding part, the storage part being configured to store the process liquid having been passed through the object to be processed. The respective first housing and the second housing can be moved in one direction, so that the first housing and the second housing can be brought into contact and separated from each other.
Public/Granted literature
- US20140053882A1 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD Public/Granted day:2014-02-27
Information query
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