Invention Grant
- Patent Title: Deposition apparatus and cleansing method using the same
- Patent Title (中): 沉积装置和使用其的清洗方法
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Application No.: US14834505Application Date: 2015-08-25
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Publication No.: US09567672B2Publication Date: 2017-02-14
- Inventor: Dae Youn Kim , Sang-Jin Jeong , Hyun Soo Jang , Young Hoon Kim , Jeong Ho Lee
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP HOLDING B.V.
- Current Assignee: ASM IP HOLDING B.V.
- Current Assignee Address: NL Almere
- Agency: Lex IP Meister, PLLC
- Priority: KR10-2014-0111702 20140826
- Main IPC: C23C16/455
- IPC: C23C16/455 ; B08B9/093 ; C23C16/44
Abstract:
Provided is a deposition apparatus including a connection channel connecting a gas inflow channel and a gas outflow channel so as to increase cleaning efficiency by providing a portion of cleaning gas to the dead space of the gas inflow channel and controlling a flow of a cleaning gas.
Public/Granted literature
- US20160060760A1 DEPOSITION APPARATUS AND CLEANSING METHOD USING THE SAME Public/Granted day:2016-03-03
Information query
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