Invention Grant
- Patent Title: Bipolar transistor
- Patent Title (中): 双极晶体管
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Application No.: US14852385Application Date: 2015-09-11
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Publication No.: US09570546B2Publication Date: 2017-02-14
- Inventor: Tony Vanhoucke , Viet Thanh Dinh , Petrus Hubertus Cornelis Magnee , Ponky Ivo , Dirk Klaassen , Mahmoud Shehab Mohammad Al-Sa'di
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP14184549 20140912
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/66 ; H03F3/21 ; H01L29/417 ; H01L21/324 ; H01L29/735 ; H01L29/08 ; H01L29/36 ; H01L29/737

Abstract:
A semiconductor device comprising a bipolar transistor and a method of making the same. A power amplifier including a bipolar transistor. The bipolar transistor includes a collector including a laterally extending drift region. The also includes a base located above the collector. The bipolar transistor further includes an emitter located above the base. The bipolar transistor also includes a doped region having a conductivity type that is different to that of the collector. The doped region extends laterally beneath the collector to form a junction at a region of contact between the doped region and the collector. The doped region has a non-uniform lateral doping profile. A doping level of the doped region is highest in a part of the doped region closest to a collector-base junction of the bipolar transistor.
Public/Granted literature
- US20160079345A1 Bipolar Transistor Public/Granted day:2016-03-17
Information query
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