Invention Grant
US09580809B2 Article with gradient property and processes for selective etching
有权
具有选择性蚀刻的梯度特性和工艺的文章
- Patent Title: Article with gradient property and processes for selective etching
- Patent Title (中): 具有选择性蚀刻的梯度特性和工艺的文章
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Application No.: US14596338Application Date: 2015-01-14
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Publication No.: US09580809B2Publication Date: 2017-02-28
- Inventor: Owen Hildreth
- Applicant: NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
- Applicant Address: US DC Washington
- Assignee: THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE
- Current Assignee: THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE
- Current Assignee Address: US DC Washington
- Agent Toby D. Hain
- Main IPC: H01L21/306
- IPC: H01L21/306 ; H01L29/06 ; C23C18/16 ; C23C18/18 ; C23C18/31 ; H01L21/285 ; H01Q17/00 ; C25F3/12
Abstract:
An article includes a substrate; and a coating disposed on the substrate that includes a microporous layer; a gradient in a density of a volume of the microporous layer, and a plurality of dendritic veins that are anisotropically disposed in the coating. A process for forming a coating includes disposing an activating catalyst on a substrate; introducing an activatable etchant; introducing an etchant oxidizer, performing an oxidation-reduction reaction between the substrate, the activatable etchant, and the etchant oxidizer in a presence of the activating catalyst, the oxidation-reduction reaction occurring in a liquid medium including the activatable etchant; and the etchant oxidizer, forming an etchant product comprising atoms from the substrate; removing a portion of the etchant product from the substrate; and forming a dendritic vein in the substrate to form the coating, the dendritic vein being anisotropically disposed in the coating.
Public/Granted literature
- US20150123249A1 ARTICLE WITH GRADIENT PROPERTY AND PROCESSES FOR SELECTIVE ETCHING Public/Granted day:2015-05-07
Information query
IPC分类:
