发明授权
- 专利标题： Direct liquid deposition
- 专利标题（中）： 直接液体沉积
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申请号： US13655501申请日： 2012-10-19
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公开(公告)号： US09593407B2公开(公告)日： 2017-03-14
- 发明人: Stephan Voser , Fabio Antonio Ravelli , Bruno Gaechter
- 申请人： OC Oerlikon Balzers AG
- 申请人地址： CH Trubbach
- 专利权人： EVATEC AG
- 当前专利权人： EVATEC AG
- 当前专利权人地址： CH Trubbach
- 代理机构： Pearne & Gordon LLP
- 主分类号： C23C14/22
- IPC分类号： C23C14/22 ; C23C14/24 ; C23C14/26 ; B05B7/16 ; B05B1/06 ; C23C14/12 ; C23C14/02 ; C23C14/50
摘要：
Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1′). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapor distribution nozzle arrangement (7) into a vacuum recipient (3) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP3′). From the two-component vapor coating substance vapor is applied to substrate 5′ to be coated. In this variant separation of solvent vapor and coating substance vapor is performed especially downstream vaporizing (STEP2′).
公开/授权文献
- US20130099020A1 DIRECT LIQUID DEPOSITION 公开/授权日：2013-04-25
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