Invention Grant
- Patent Title: Exposure apparatus and method thereof
- Patent Title (中): 曝光装置及其方法
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Application No.: US14226621Application Date: 2014-03-26
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Publication No.: US09594307B2Publication Date: 2017-03-14
- Inventor: Cha-Dong Kim , Hoon Kang , Chang-Hoon Kim , Sang-Hyun Yun , Jung-In Park , Woo-Yong Sung , Ki-Beom Lee , Hi-Kuk Lee , Jae-Hyuk Chang
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2013-0097720 20130819
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20

Abstract:
An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.
Public/Granted literature
- US20150049316A1 EXPOSURE APPARATUS AND METHOD THEREOF Public/Granted day:2015-02-19
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