Digital exposure device
    1.
    发明授权

    公开(公告)号:US09684164B2

    公开(公告)日:2017-06-20

    申请号:US14169215

    申请日:2014-01-31

    CPC classification number: G02B26/0866 G03F7/70291 G03F7/70475 G03F7/70508

    Abstract: A digital exposure device includes: a stage having a substrate seated thereon where a pattern is to be formed and moving in a scan direction; a data modification unit receiving design data and generating modified data by extending the design data; and a digital exposure unit receiving the design data and projecting a light controlled according to the design data on the substrate, wherein the modified data includes intermedial data corresponding to the size difference between an image of the design data and an image of the modified data and some of unit data forming the intermedial data are data obtained when unit data of the design data are shifted in any expansion direction.

    Digital exposure device using digital micro-mirror device and a method for controlling the same
    3.
    发明授权
    Digital exposure device using digital micro-mirror device and a method for controlling the same 有权
    使用数字微镜装置的数字曝光装置及其控制方法

    公开(公告)号:US09310697B2

    公开(公告)日:2016-04-12

    申请号:US14141147

    申请日:2013-12-26

    Abstract: Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head.

    Abstract translation: 提供了一种数字曝光装置。 数字曝光装置包括安装有其上形成有图案的基板的台,第一光源,第一头和数字微镜装置控制单元。 舞台被配置为沿扫描方向移动。 第一光源被配置为提供第一光。 第一头部在第一方向上与舞台间隔开,并且被配置为接收第一光,通过调制第一光以产生至少一个点光束,并将至少一个光束投射到衬底上。 数字微镜装置控制单元被配置为控制从第一头产生的至少一个点束的能量与从第一头产生的至少点光束的尺寸成反比。

    Display Device and a Method of Manufacturing the Same
    4.
    发明申请
    Display Device and a Method of Manufacturing the Same 有权
    显示设备及其制造方法

    公开(公告)号:US20140198290A1

    公开(公告)日:2014-07-17

    申请号:US14036961

    申请日:2013-09-25

    CPC classification number: G02F1/133377 G02F1/134363 G02F2001/133302

    Abstract: The present invention relates to a display device and a method of manufacturing the display device. The display device according to an exemplary embodiment of the present invention includes a substrate. A pixel electrode is formed on the substrate. A roof layer is formed on the pixel electrode. A first micro-cavity and a second micro-cavity are disposed between the pixel electrode and the roof layer. A liquid crystal fills the first and second micro-cavities. The first and second micro-cavities are connected to each other by a path. The path penetrates the roof layer.

    Abstract translation: 本发明涉及一种显示装置及其制造方法。 根据本发明的示例性实施例的显示装置包括基板。 在基板上形成像素电极。 在像素电极上形成屋顶层。 第一微腔和第二微腔设置在像素电极和屋顶层之间。 液晶填充第一和第二微腔。 第一和第二微腔通过路径相互连接。 路径穿透屋顶层。

    Thin film transistor substrate, method of manufacturing the same and display device having the same
    5.
    发明授权
    Thin film transistor substrate, method of manufacturing the same and display device having the same 有权
    薄膜晶体管基板及其制造方法以及具有该薄膜晶体管基板的显示装置

    公开(公告)号:US09575386B2

    公开(公告)日:2017-02-21

    申请号:US13961714

    申请日:2013-08-07

    Abstract: A thin film transistor substrate is provided. The thin film transistor substrate includes a display area including a plurality of pixels, wherein the pixels are connected to gate lines and data lines, a gate driver connected to the gate lines, a plurality of data pads connected to the data lines, a plurality of dummy pattern parts formed of a same layer as the gate lines, and a non-display area in which the gate driver, data pads, and dummy pattern parts are disposed, and the dummy pattern parts are disposed in an area within the non-display area where the gate driver is not disposed, and one of the dummy pattern parts is disposed overlapping with the data pads.

    Abstract translation: 提供薄膜晶体管基板。 薄膜晶体管基板包括包括多个像素的显示区域,其中像素连接到栅极线和数据线,连接到栅极线的栅极驱动器,连接到数据线的多个数据焊盘,多个 由与栅极线相同的层形成的虚拟图形部分,以及设置栅极驱动器,数据焊盘和虚设图案部分的非显示区域,并且虚设图案部分设置在非显示器内的区域中 没有设置栅极驱动器的区域,并且虚设图案部分中的一个与数据焊盘重叠设置。

    Method of fabricating display device using maskless exposure apparatus and display device
    6.
    发明授权
    Method of fabricating display device using maskless exposure apparatus and display device 有权
    使用无掩模曝光装置和显示装置制造显示装置的方法

    公开(公告)号:US09046779B2

    公开(公告)日:2015-06-02

    申请号:US13861039

    申请日:2013-04-11

    Abstract: The present invention relates to a method of fabricating a display device using a maskless exposure apparatus, and the display device, and more particularly, to a method of fabricating a display device by using a maskless exposure apparatus, which is capable of preventing a stain from being viewed, and the display device. An exemplary embodiment of the present invention provides a method of fabricating a display device, including: forming a first exposure region on a substrate by performing exposure while scanning the substrate with a first exposure head irradiating an exposure beam according to pattern information of a first pattern in a scanning direction; and forming a second exposure region adjacent to the first exposure region on the substrate by performing exposure while scanning the substrate with a second exposure head irradiating an exposure beam according to the pattern information of the first pattern in the scanning direction; in which an exposure boundary region between the first exposure region and the second exposure region is extended in the scanning direction, and the exposure boundary region overlaps a light blocking region.

    Abstract translation: 本发明涉及使用无掩模曝光装置和显示装置制造显示装置的方法,更具体地说,涉及一种使用无掩模曝光装置制造显示装置的方法,该无掩模曝光装置能够防止 被观看,以及显示装置。 本发明的一个示例性实施例提供了一种制造显示装置的方法,包括:通过在用基于第一图案的图案信息的照射曝光光束的第一曝光头扫描基板的同时进行曝光来在基板上形成第一曝光区域 在扫描方向; 以及根据所述第一图案在所述扫描方向上的图案信息,利用照射曝光光束的第二曝光头对所述基板进行曝光,同时在所述基板上形成与所述第一曝光区域相邻的第二曝光区域; 其中第一曝光区域和第二曝光区域之间的曝光边界区域在扫描方向上延伸,并且曝光边界区域与遮光区域重叠。

    Method of measuring uniformity of exposing light and exposure system for performing the same
    7.
    发明授权
    Method of measuring uniformity of exposing light and exposure system for performing the same 有权
    测量曝光光的均匀性和进行曝光系统的方法

    公开(公告)号:US08902414B2

    公开(公告)日:2014-12-02

    申请号:US13669751

    申请日:2012-11-06

    CPC classification number: G01J1/00 G03F7/20 G03F7/70133

    Abstract: An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.

    Abstract translation: 曝光系统包括曝光装置,掩模,测试图案部分和均匀度测量部分。 曝光装置包括第一模块和第二模块。 第一和第二模块各自发光并且在重叠区域中重叠。 掩模包括彼此间隔开的多个传输部分。 每个传输部分具有小于重叠区域的宽度的宽度。 测试图形部分包括通过使用透过掩模的透射部分的光而构图的多个测试图案。 均匀度测量部件测量测试图案的均匀性。

    Exposure apparatus and method thereof
    8.
    发明授权
    Exposure apparatus and method thereof 有权
    曝光装置及其方法

    公开(公告)号:US09594307B2

    公开(公告)日:2017-03-14

    申请号:US14226621

    申请日:2014-03-26

    CPC classification number: G03F7/70291 G03F7/70508 G03F7/7055

    Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

    Abstract translation: 曝光装置包括光源,照明构件,突出构件,台,检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成(PEG)提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案,以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。

    Display device and a method of manufacturing the same
    9.
    发明授权
    Display device and a method of manufacturing the same 有权
    显示装置及其制造方法

    公开(公告)号:US09244302B2

    公开(公告)日:2016-01-26

    申请号:US14036961

    申请日:2013-09-25

    CPC classification number: G02F1/133377 G02F1/134363 G02F2001/133302

    Abstract: The present invention relates to a display device and a method of manufacturing the display device. The display device according to an exemplary embodiment of the present invention includes a substrate. A pixel electrode is formed on the substrate. A roof layer is formed on the pixel electrode. A first micro-cavity and a second micro-cavity are disposed between the pixel electrode and the roof layer. A liquid crystal fills the first and second micro-cavities. The first and second micro-cavities are connected to each other by a path. The path penetrates the roof layer.

    Abstract translation: 本发明涉及一种显示装置及其制造方法。 根据本发明的示例性实施例的显示装置包括基板。 在基板上形成像素电极。 在像素电极上形成屋顶层。 第一微腔和第二微腔设置在像素电极和屋顶层之间。 液晶填充第一和第二微腔。 第一和第二微腔通过路径相互连接。 路径穿透屋顶层。

    DIGITAL EXPOSURE DEVICE USING DIGITAL MICRO-MIRROR DEVICE AND A METHOD FOR CONTROLLING THE SAME
    10.
    发明申请
    DIGITAL EXPOSURE DEVICE USING DIGITAL MICRO-MIRROR DEVICE AND A METHOD FOR CONTROLLING THE SAME 有权
    使用数字微镜装置的数字曝光装置及其控制方法

    公开(公告)号:US20150015859A1

    公开(公告)日:2015-01-15

    申请号:US14141147

    申请日:2013-12-26

    Abstract: Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head.

    Abstract translation: 提供了一种数字曝光装置。 数字曝光装置包括安装有其上形成有图案的基板的台,第一光源,第一头和数字微镜装置控制单元。 舞台被配置为沿扫描方向移动。 第一光源被配置为提供第一光。 第一头部在第一方向上与舞台间隔开,并且被配置为接收第一光,通过调制第一光以产生至少一个点光束,并将至少一个光束投射到衬底上。 数字微镜装置控制单元被配置为控制从第一头产生的至少一个点束的能量与从第一头产生的至少点光束的尺寸成反比。

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