公开(公告)号：US09335631B2

公开(公告)日：2016-05-10

申请号：US14446282

申请日：2014-07-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom Lee ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Jung-In Park

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/40 ,  C08F220/30

CPC classification number: G03F7/0388 ,  C08F220/30 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/40

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract translation: 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。

公开(公告)号：US09081233B2

公开(公告)日：2015-07-14

申请号：US13673999

申请日：2012-11-10

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Dae-Hwan Jang ,  Gug-Rae Jo ,  Min-Uk Kim ,  Hyun-Seok Kim ,  Sung-Hee Lee ,  Jae-Hyuk Chang ,  Nam-Ok Jung

IPC: G02F1/1339 ,  G02B27/26 ,  G02F1/1343

CPC classification number: G02F1/1339 ,  G02B27/26 ,  G02F1/13392 ,  G02F1/13394 ,  G02F1/134309

Abstract: A polarizing liquid crystal panel includes a first substrate including a first base substrate, a first alignment layer, and a first electrode between the first base substrate and the first alignment layer, a second substrate including a second base substrate, a second alignment layer, and a second electrode between the second base substrate and the second alignment layer, the second substrate facing the first substrate, a spacer between the first and second substrates and maintaining a cell gap therebetween, and a liquid crystal flow preventing portion between the first and second substrates. The liquid crystal flow preventing portion extends in a first direction, and restricts movement of the spacer in a second direction substantially perpendicular to the first direction.

Abstract translation: 偏振液晶面板包括：第一基板，包括第一基板，第一取向层，以及第一基板和第一取向层之间的第一电极;第二基板，包括第二基板，第二取向层， 所述第二基板和所述第二取向层之间的第二电极，所述第二基板面对所述第一基板，所述第一基板与所述第二基板之间保持间隔，并且保持在所述第一基板与所述第二基板之间的液晶流阻止部 。 液晶防止部分沿第一方向延伸，并且限制间隔物在基本上垂直于第一方向的第二方向上的移动。

公开(公告)号：US20150168833A1

公开(公告)日：2015-06-18

申请号：US14446282

申请日：2014-07-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom Lee ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Jung-In Park

IPC: G03F7/038 ,  G03F7/40

CPC classification number: G03F7/0388 ,  C08F220/30 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/40

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract translation: 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。

公开(公告)号：US09746780B2

公开(公告)日：2017-08-29

申请号：US14745366

申请日：2015-06-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

公开(公告)号：US09690204B2

公开(公告)日：2017-06-27

申请号：US14664770

申请日：2015-03-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sang-Hyun Lee ,  Hyun-Seok Kim ,  Jung-Chul Heo ,  Hi-Kuk Lee ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Chang-Hoon Kim ,  Jung-In Park ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Jae-Hyuk Chang

IPC: G03B27/44 ,  G03B27/68 ,  G03F7/20 ,  H01L29/786 ,  H01L27/12 ,  H01L29/417

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  H01L27/124 ,  H01L27/1285 ,  H01L29/41733 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

公开(公告)号：US09436098B2

公开(公告)日：2016-09-06

申请号：US14635339

申请日：2015-03-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jung-Chul Heo ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Hyun-Seok Kim ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Byoung-Min Yun ,  Sang-Don Jang ,  Jae-Young Jang ,  Chang-Hoon Kim

IPC: G03F7/20 ,  H01L29/786 ,  H01L27/12

CPC classification number: G03F7/70508 ,  G03F7/2022 ,  G03F7/2051 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70391 ,  H01L27/1222 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/78669 ,  H01L29/78693 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置的曝光头。 数字微镜装置被配置为将从曝光源施加的源光束传输到衬底。 系统控制部分被配置为通过使用图形数据系统文件来控制数字微镜装置。 图形数据系统文件包括用于形成源电极，漏电极和设置在源电极和漏电极之间的沟道部分的数据。 图形系统文件包括用于形成相对于曝光头的扫描方向沿对角线方向延伸的通道部分的数据。

公开(公告)号：US20160116847A1

公开(公告)日：2016-04-28

申请号：US14745366

申请日：2015-06-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置和曝光源的曝光头，数字微镜装置被配置为将从曝光源输出的源光束反射到基板，以及系统控制器，被配置为控制数字 微镜设备通过使用图形数据系统文件。 图形数据系统文件包括关于要在基板上形成的图案的数据。 在与曝光头的扫描方向平行的方向上延伸的图案包括具有大于目标宽度的第一宽度的第一图案部分和与第一图案部分交替设置的第二图案部分，并且具有第二宽度， 小于目标宽度。

公开(公告)号：US09023558B2

公开(公告)日：2015-05-05

申请号：US13655597

申请日：2012-10-19

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Beom Lee ,  Su-Yeon Sim ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Hi-Kuk Lee

IPC: G03F7/031 ,  G03F7/20 ,  G03F7/00 ,  G03F7/029 ,  G03F7/033 ,  G03F7/105

CPC classification number: G03F7/2051 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/105

Abstract: Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.

Abstract translation: 本发明的示例性实施方案涉及光致抗蚀剂组合物和使用其形成滤色器的方法。 根据示例性实施方案的光致抗蚀剂组合物包含约5重量％至约10重量％的粘合剂树脂，约5重量％至约10重量％的单体，约1重量％至约15重量％ 光引发剂的重量被配置为激活具有约400nm至约410nm的峰值波长的光，约1重量％至约10重量％的颜料，约0.01重量％至约1重量％ 的颜料分散剂和溶剂。

公开(公告)号：US09726982B2

公开(公告)日：2017-08-08

申请号：US14831830

申请日：2015-08-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hi-Kuk Lee ,  Jae-Young Jang ,  Jae-Hyuk Chang ,  Sang-Don Jang

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70275 ,  G03F7/70291 ,  G03F7/70358 ,  G03F7/70558

Abstract: A maskless exposure device including a light source configured to emit an exposure beam, a light modulation element configured to modulate the exposure beam according to an exposure pattern, a projection optical system configured to transfer a modulated exposure beam to a substrate as a beam spot array, a beam measurement part configured to measure a beam data of the beam spot array, and a compensating mask generator configured to generate a compensating mask by utilizing a measured data of the exposure beam for compensating cumulative illumination, wherein the compensating mask generator is configured to turn off left and right beams of a first selected spot beam selected by the beam data, and then to turn off a second selected spot beam.

公开(公告)号：US09535333B2

公开(公告)日：2017-01-03

申请号：US14836422

申请日：2015-08-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Kab-Jong Seo ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Ki-Beom Lee

IPC: G03B27/44 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/7005 ,  G03F7/704

Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.

Abstract translation: 无掩模曝光装置包括多个曝光头，每个曝光头包括配置成将曝光光束扫描到基板的数字微镜装置，曝光头设置在交错的第一和第二行中，多个反射部件设置在 曝光头的侧表面并且具有彼此平行的反射表面，被配置为对反射构件发光的发光部，以及被配置为经由反射构件接收光的光接收部。