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19 条记录 (耗时 0.019 秒)

    PHOTORESIST COMPOSITION AND METHOD OF FORMING A COLOR FILTER USING THE SAME
    1.
    发明申请
    PHOTORESIST COMPOSITION AND METHOD OF FORMING A COLOR FILTER USING THE SAME 有权
    光刻胶组合物和使用其形成色彩过滤器的方法

    公开(公告)号：US20130302727A1

    公开(公告)日：2013-11-14

    申请号：US13655597

    申请日：2012-10-19

    申请人： SAMSUNG DISPLAY CO., LTD.

    发明人： Ki-Beom LEE ,  Su-Yeon Sim ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Hi-Kuk Lee

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/2051 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/105

    摘要： Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.

    摘要翻译： 本发明的示例性实施方案涉及光致抗蚀剂组合物和使用其形成滤色器的方法。 根据示例性实施方案的光致抗蚀剂组合物包含约5重量％至约10重量％的粘合剂树脂，约5重量％至约10重量％的单体，约1重量％至约15重量％ 光引发剂的重量被配置为激活具有约400nm至约410nm的峰值波长的光，约1重量％至约10重量％的颜料，约0.01重量％至约1重量％ 的颜料分散剂和溶剂。

    Maskless exposure device and maskless exposure method using the same
    4.
    发明授权
    Maskless exposure device and maskless exposure method using the same 有权
    无掩模曝光装置和无掩模曝光方法

    公开(公告)号：US09535333B2

    公开(公告)日：2017-01-03

    申请号：US14836422

    申请日：2015-08-26

    申请人： SAMSUNG DISPLAY CO., LTD.

    发明人： Kab-Jong Seo ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Ki-Beom Lee

    IPC分类号： G03B27/44 ,  G03B27/54 ,  G03F7/20

    CPC分类号： G03F7/70141 ,  G03F7/7005 ,  G03F7/704

    摘要： A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.

    摘要翻译： 无掩模曝光装置包括多个曝光头，每个曝光头包括配置成将曝光光束扫描到基板的数字微镜装置，曝光头设置在交错的第一和第二行中，多个反射部件设置在 曝光头的侧表面并且具有彼此平行的反射表面，被配置为对反射构件发光的发光部，以及被配置为经由反射构件接收光的光接收部。

    MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD
    9.
    发明申请
    MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD 有权
    无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法

    公开(公告)号：US20160116847A1

    公开(公告)日：2016-04-28

    申请号：US14745366

    申请日：2015-06-19

    申请人： SAMSUNG DISPLAY CO., LTD.

    发明人： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

    摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

    摘要翻译： 无掩模曝光装置包括具有数字微镜装置和曝光源的曝光头，数字微镜装置被配置为将从曝光源输出的源光束反射到基板，以及系统控制器，被配置为控制数字 微镜设备通过使用图形数据系统文件。 图形数据系统文件包括关于要在基板上形成的图案的数据。 在与曝光头的扫描方向平行的方向上延伸的图案包括具有大于目标宽度的第一宽度的第一图案部分和与第一图案部分交替设置的第二图案部分，并且具有第二宽度， 小于目标宽度。

    Photoresist composition and method of forming a color filter using the same
    10.
    发明授权
    Photoresist composition and method of forming a color filter using the same 有权
    光刻胶组合物和使用其形成滤色器的方法

    公开(公告)号：US09023558B2

    公开(公告)日：2015-05-05

    申请号：US13655597

    申请日：2012-10-19

    申请人： Samsung Display Co., Ltd.

    发明人： Ki-Beom Lee ,  Su-Yeon Sim ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Hi-Kuk Lee

    IPC分类号： G03F7/031 ,  G03F7/20 ,  G03F7/00 ,  G03F7/029 ,  G03F7/033 ,  G03F7/105

    CPC分类号： G03F7/2051 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/105

    摘要： Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.

    摘要翻译： 本发明的示例性实施方案涉及光致抗蚀剂组合物和使用其形成滤色器的方法。 根据示例性实施方案的光致抗蚀剂组合物包含约5重量％至约10重量％的粘合剂树脂，约5重量％至约10重量％的单体，约1重量％至约15重量％ 光引发剂的重量被配置为激活具有约400nm至约410nm的峰值波长的光，约1重量％至约10重量％的颜料，约0.01重量％至约1重量％ 的颜料分散剂和溶剂。