Invention Grant
US09595665B2 Non-reactive photoresist removal and spacer layer optimization in a magnetoresistive device
有权
磁阻器件中的非反应性光致抗蚀剂去除和间隔层优化
- Patent Title: Non-reactive photoresist removal and spacer layer optimization in a magnetoresistive device
- Patent Title (中): 磁阻器件中的非反应性光致抗蚀剂去除和间隔层优化
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Application No.: US15147682Application Date: 2016-05-05
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Publication No.: US09595665B2Publication Date: 2017-03-14
- Inventor: Sarin A. Deshpande , Sanjeev Aggarwal , Kerry Joseph Nagel , Chaitanya Mudivarthi , Nicholas Rizzo , Jason Allen Janesky
- Applicant: Everspin Technologies, Inc.
- Applicant Address: US AZ Chandler
- Assignee: Everspin Technologies, Inc.
- Current Assignee: Everspin Technologies, Inc.
- Current Assignee Address: US AZ Chandler
- Main IPC: H01L43/12
- IPC: H01L43/12 ; H01L43/08 ; H01L27/22

Abstract:
In forming a top electrode for a magnetoresistive device, photoresist used in patterning the electrode is stripped using a non-reactive stripping process. Such a non-reactive stripping process uses water vapor or some other non-oxidizing gas that also passivates exposed portions the magnetoresistive device. In such magnetoresistive devices, a non-reactive spacer layer is included that helps prevent diffusion between layers in the magnetoresistive device, where the non-reactive nature of the spacer layer prevents sidewall roughness that can interfere with accurate formation of the lower portions of the magnetoresistive device.
Public/Granted literature
- US20160315253A1 NON-REACTIVE PHOTORESIST REMOVAL AND SPACER LAYER OPTIMIZATION IN A MAGNETORESISTIVE DEVICE Public/Granted day:2016-10-27
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