Invention Grant
US09595665B2 Non-reactive photoresist removal and spacer layer optimization in a magnetoresistive device 有权
磁阻器件中的非反应性光致抗蚀剂去除和间隔层优化

Non-reactive photoresist removal and spacer layer optimization in a magnetoresistive device
Abstract:
In forming a top electrode for a magnetoresistive device, photoresist used in patterning the electrode is stripped using a non-reactive stripping process. Such a non-reactive stripping process uses water vapor or some other non-oxidizing gas that also passivates exposed portions the magnetoresistive device. In such magnetoresistive devices, a non-reactive spacer layer is included that helps prevent diffusion between layers in the magnetoresistive device, where the non-reactive nature of the spacer layer prevents sidewall roughness that can interfere with accurate formation of the lower portions of the magnetoresistive device.
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