Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US13903885Application Date: 2013-05-28
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Publication No.: US09606448B2Publication Date: 2017-03-28
- Inventor: Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP03255377 20030829
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20

Abstract:
A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
Public/Granted literature
- US20140071420A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2014-03-13
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