Invention Grant
- Patent Title: 193 nm laser and an inspection system using a 193 nm laser
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Application No.: US14210355Application Date: 2014-03-13
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Publication No.: US09608399B2Publication Date: 2017-03-28
- Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Justin Dianhuan Liou , Vladimir Dribinski , John Fielden
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Bever, Hoffman & Harms, LLP
- Main IPC: H01S3/23
- IPC: H01S3/23 ; G01N21/47 ; G01N21/95 ; H01S3/30 ; G02F1/35 ; G01N21/88 ; H01S3/06 ; H01S3/067 ; H01S3/0941 ; H01S3/16 ; H01S3/00

Abstract:
An improved laser uses a pump laser with a wavelength near 1109 nm and a fundamental wavelength near 1171 nm to generate light at a wavelength between approximately 189 nm and approximately 200 nm, e.g. 193 nm. The laser mixes the 1109 nm pump wavelength with the 5th harmonic of the 1171 nm fundamental, which is at a wavelength of approximately 234.2 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
Public/Granted literature
- US20160056606A1 193nm Laser And An Inspection System Using A 193nm Laser Public/Granted day:2016-02-25
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