Invention Grant
- Patent Title: Salt and photoresist composition comprising the same
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Application No.: US14601895Application Date: 2015-01-21
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Publication No.: US09612533B2Publication Date: 2017-04-04
- Inventor: Tatsuro Masuyama , Koji Ichikawa , Satoshi Yamamoto
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-011113 20140124
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C43/12 ; C07C381/12 ; G03F7/039
Abstract:
A salt which generates an acid by light irradiation, said salt comprising:an acid-labile group having an acetal structure from which group a moiety having a fluorine-containing base-labile group is removed by bring into contact with the acid.
Public/Granted literature
- US20150212408A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME Public/Granted day:2015-07-30
Information query
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