Invention Grant
- Patent Title: Thin film capacitor
-
Application No.: US14799247Application Date: 2015-07-14
-
Publication No.: US09620291B2Publication Date: 2017-04-11
- Inventor: Junji Aotani , Shigeaki Tanaka , Katsuyuki Kurachi , Tatsuo Namikawa , Yuuki Aburakawa
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2014-145779 20140716
- Main IPC: H01G4/30
- IPC: H01G4/30 ; H01G4/33 ; H01G4/012 ; H01G4/01 ; H01G4/015 ; H01G4/12

Abstract:
A thin film capacitor including a lower electrode layer, a dielectric layer provided on the lower electrode layer, and an upper electrode layer formed on the dielectric layer, wherein the dielectric layer includes a recessed portion in a portion on the upper face thereof, a cross-sectional structure perpendicular to the dielectric layer of the recessed portion has a cross-sectional taper angle of 1 degree or more and 25 degrees or less, and the distance between the bottom portion center and an outermost portion of the recessed portion is 20 times or more and 150 times or less a thickness of the dielectric layer.
Public/Granted literature
- US20160020030A1 THIN FILM CAPACITOR Public/Granted day:2016-01-21
Information query