发明授权
- 专利标题： Substrate to which film is formed, method for production, and organic EL display device
-
申请号： US13980571申请日： 2012-01-13
-
公开(公告)号： US09622319B2公开(公告)日： 2017-04-11
- 发明人: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- 申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- 申请人地址： JP Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JP Osaka
- 代理机构： Morrison & Foerster LLP
- 优先权： JP2011-010179 20110120
- 国际申请： PCT/JP2012/050579 WO 20120113
- 国际公布： WO2012/099011 WO 20120726
- 主分类号： H05B33/14
- IPC分类号： H05B33/14 ; H01L27/32 ; H01L51/56 ; H01L51/00 ; C23C14/04 ; C23C14/54
摘要：
A film formation substrate is arranged such that (i) a base end, in a y-axis direction, of a film-thickness-gradually-diminishing part of a first film overlaps a first film formation region, and (ii) a film-thickness-gradually-diminishing part of a second film is disposed on an outside, in the y-axis direction, of a second film formation region and overlaps the film-thickness-gradually-diminishing part of the first film so as to compensate for a gradually diminished thickness of the film-thickness-gradually-diminishing part.
公开/授权文献
信息查询
