Invention Grant
- Patent Title: Substrate treating apparatus
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Application No.: US14681506Application Date: 2015-04-08
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Publication No.: US09627236B2Publication Date: 2017-04-18
- Inventor: Sang Jin Lee , Ji Hoon Choi , Doo Jin Kim
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Carter, DeLuca, Farrell & Schmidt, LLP
- Priority: KR10-2014-0043692 20140411
- Main IPC: H01L21/67
- IPC: H01L21/67

Abstract:
A substrate treating apparatus is provided which includes housing and a door assembly. The housing provides a process space for treating a substrate therein and has an opening formed at a sidewall thereof. The door assembly opens and closes the opening. The door assembly includes a shutter, a driving member, and a gap maintaining unit. The driving member transfers the shutter to an open position where the shutter faces to the opening and to a blocking position where the shutter gets out of the open position. The gap maintaining unit maintains a constant gap between the shutter and the sidewall.
Public/Granted literature
- US20150290685A1 SUBSTRATE TREATING APPARATUS Public/Granted day:2015-10-15
Information query
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