- 专利标题: Semiconductor device and method of manufacturing semiconductor device
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申请号: US15109597申请日: 2015-02-06
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公开(公告)号: US09640610B2公开(公告)日: 2017-05-02
- 发明人: Kenji Hamada , Naruhisa Miura
- 申请人: MITSUBISHI ELECTRIC CORPORATION
- 申请人地址: JP Chiyoda-ku
- 专利权人: Mitsubishi Electric Corporation
- 当前专利权人: Mitsubishi Electric Corporation
- 当前专利权人地址: JP Chiyoda-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2014-037760 20140228
- 国际申请: PCT/JP2015/053405 WO 20150206
- 国际公布: WO2015/129430 WO 20150903
- 主分类号: H01L29/15
- IPC分类号: H01L29/15 ; H01L29/06 ; H01L29/66 ; H01L29/739 ; H01L29/16 ; H01L21/265 ; H01L29/32 ; H01L21/04 ; H01L27/06 ; H01L29/10 ; H01L29/08
摘要:
An IGBT includes an emitter electrode, base regions, an emitter region, a collector region, a collector electrode, a gate insulating film provided in contact with the silicon carbide semiconductor region, the emitter region, and the base region, and a gate electrode that faces the gate insulating film. A FWD includes a base contact region provided adjacent to the emitter region and electrically connected to the emitter electrode, and a cathode region disposed in the upper layer part on the other main surface side of the silicon carbide semiconductor region, provided adjacent to the collector region, and electrically connected to the collector electrode. The IGBT further includes a reduced carrier-trap region disposed in a principal current-carrying region of the silicon carbide semiconductor region located above the collector region and having a smaller number of carrier traps than the silicon carbide semiconductor region located above the cathode region.
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