- 专利标题: Method of controlling a radiation source and lithographic apparatus comprising the radiation source
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申请号: US14787738申请日: 2014-04-16
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公开(公告)号: US09645510B2公开(公告)日: 2017-05-09
- 发明人: Wilhelmus Patrick Elisabeth Maria Op 'T Root , Adrianus Leonardus Gertrudus Bommer , Robert De Jong , Frank Everts , Herman Philip Godfried , Roland Pieter Stolk , Paul Van Der Veen
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/EP2014/057709 WO 20140416
- 国际公布: WO2014/187619 WO 20141127
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03F7/20 ; H01S3/104 ; H01S3/0975 ; H01S3/225
摘要:
A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.
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