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公开(公告)号：US11314174B2
公开(公告)日：2022-04-26
申请号：US16645672
申请日：2018-08-03
发明人： Laurentius Cornelius De Winter , Roland Pieter Stolk , Frank Staals , Anton Bernhard Van Oosten , Paul Christiaan Hinnen , Marinus Jochemsen , Thomas Theeuwes , Eelco Van Setten
摘要： Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.
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2.发明授权公开(公告)号：US09645510B2
公开(公告)日：2017-05-09
申请号：US14787738
申请日：2014-04-16
发明人： Wilhelmus Patrick Elisabeth Maria Op 'T Root , Adrianus Leonardus Gertrudus Bommer , Robert De Jong , Frank Everts , Herman Philip Godfried , Roland Pieter Stolk , Paul Van Der Veen
IPC分类号： G03B27/42 , G03F7/20 , H01S3/104 , H01S3/0975 , H01S3/225
CPC分类号： G03F7/70558 , G03F7/70025 , G03F7/70516 , H01S3/0975 , H01S3/104 , H01S3/225
摘要： A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.
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