Invention Grant
- Patent Title: Resist fortification for magnetic media patterning
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Application No.: US14170009Application Date: 2014-01-31
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Publication No.: US09646642B2Publication Date: 2017-05-09
- Inventor: Christopher Dennis Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: G11B5/66
- IPC: G11B5/66 ; G11B5/74 ; G11B5/855 ; G11B5/85

Abstract:
A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.
Public/Granted literature
- US20140147700A1 RESIST FORTIFICATION FOR MAGNETIC MEDIA PATTERNING Public/Granted day:2014-05-29
Information query
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