Invention Grant
- Patent Title: Method to produce chemical pattern in micro-fluidic structure
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Application No.: US15167764Application Date: 2016-05-27
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Publication No.: US09656260B2Publication Date: 2017-05-23
- Inventor: Shang-Ying Tsai , Li-Min Hung , Jung-Huei Peng
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: B29C65/00
- IPC: B29C65/00 ; B32B37/30 ; G01N15/06 ; G01N33/00 ; G01N33/48 ; B82Y10/00 ; B01L3/00 ; B82Y30/00

Abstract:
The present disclosure provides flow cells and methods of fabricating flow cells. The method includes combining three portions: a first substrate, a second substrate, and microfluidic channels between the first substrate and the second substrate having walls of a photoresist dry film. Through-holes for inlet and outlet are formed in the first substrate or the second substrate. Patterned capture sites are stamped on the first substrate and the second substrate by a nanoimprint lithography process. In other embodiments, parts of the patterned capture sites are selectively attached to a surface chemistry pattern formed of silicon oxide islands each disposed on an outcrop of a soft bottom layer.
Public/Granted literature
- US20160271607A1 Method to Produce Chemical Pattern in Micro-Fluidic Structure Public/Granted day:2016-09-22
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