Invention Grant
- Patent Title: Device and method for localized underfill
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Application No.: US15151176Application Date: 2016-05-10
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Publication No.: US09673124B2Publication Date: 2017-06-06
- Inventor: Liang Wang , Rajesh Katkar , Charles G. Woychik , Cyprian Emeka Uzoh
- Applicant: Invensas Corporation
- Applicant Address: US CA San Jose
- Assignee: Invensas Corporation
- Current Assignee: Invensas Corporation
- Current Assignee Address: US CA San Jose
- Agency: Haynes and Boone, LLP
- Main IPC: H01L23/31
- IPC: H01L23/31 ; H01L21/56 ; H01L25/065 ; H01L25/00 ; H01L23/13 ; H01L21/48 ; H01L21/52 ; H01L21/54 ; H01L23/498

Abstract:
A device and method for localizing underfill includes a substrate, a plurality of dies, and underfill material. The substrate includes a plurality of contacts and a plurality of cavities separated by a plurality of mesas. The plurality of dies is mounted to the substrate using the plurality of contacts. The underfill material is located between the substrate and the dies. The underfill material is localized into a plurality of regions using the mesas. Each of the contacts is located in a respective one of the cavities. In some embodiments, the substrate further includes a plurality of channels interconnecting the cavities. In some embodiments, the substrate further includes a plurality of intra-cavity mesas for further localizing the underfill material. In some embodiments, outer edges of a first one of the dies rest on first mesas located on edges of a first one of the cavities.
Public/Granted literature
- US20160254205A1 DEVICE AND METHOD FOR LOCALIZED UNDERFILL Public/Granted day:2016-09-01
Information query
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