- 专利标题: Semiconductor device and method of forming interconnect substrate for FO-WLCSP
-
申请号: US13243214申请日: 2011-09-23
-
公开(公告)号: US09679863B2公开(公告)日: 2017-06-13
- 发明人: Yaojian Lin , Jianmin Fang , Xia Feng , Kang Chen
- 申请人: Yaojian Lin , Jianmin Fang , Xia Feng , Kang Chen
- 申请人地址: SG Singapore
- 专利权人: STATS ChipPAC Pte. Ltd.
- 当前专利权人: STATS ChipPAC Pte. Ltd.
- 当前专利权人地址: SG Singapore
- 代理机构: Patent Law Group: Atkins and Associates, P.C.
- 代理商 Robert D. Atkins
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L23/00 ; H01L21/56 ; H01L25/10 ; H01L25/00 ; H01L23/498 ; H01L23/538 ; H01L23/31 ; H01L21/683
摘要:
A semiconductor device has a first encapsulant deposited over a first carrier. A plurality of conductive vias is formed through the first encapsulant to provide an interconnect substrate. A first semiconductor die is mounted over a second carrier. The interconnect substrate is mounted over the second carrier adjacent to the first semiconductor die. A second semiconductor die is mounted over the second carrier adjacent to the interconnect substrate. A second encapsulant is deposited over the first and second semiconductor die, interconnect substrate, and second carrier. A first interconnect structure is formed over a first surface of the second encapsulant and electrically connected to the conductive vias. A second interconnect structure is formed over a second surface of the second encapsulant and electrically connected to the conductive vias to make the Fo-WLCSP stackable. Additional semiconductor die can be mounted over the first and second semiconductor die in a PoP arrangement.
公开/授权文献
信息查询
IPC分类: