- 专利标题: Liquid process apparatus and liquid process method
-
申请号: US13546372申请日: 2012-07-11
-
公开(公告)号: US09691602B2公开(公告)日: 2017-06-27
- 发明人: Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
- 申请人: Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
- 申请人地址: JP Minato-Ku
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Minato-Ku
- 代理机构: Burr & Brown, PLLC
- 优先权: JP2011-154074 20110712; JP2011-154084 20110712
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; H01L21/67
摘要:
A top plate is provided with a top plate rotation mechanism configured to rotate the top plate in a horizontal plane. An outside cup peripheral case disposed around a cup is configured to move between an upper position, in which a top end of the cylinder is positioned above the cup, and a lower position located below the upper position. A nozzle support arm configured to support a nozzle is moved, in a horizontal direction, between an advanced position, in which the arm is advanced into the outside cup peripheral case via a side opening formed in a side surface of the outside cup peripheral case when the cylinder is located in the upper position, and a retracted position, in which the arm is retracted outward from the outside cup peripheral case.
公开/授权文献
- US20130014786A1 LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD 公开/授权日:2013-01-17
信息查询
IPC分类: