- 专利标题: High-concentration active doping in semiconductors and semiconductor devices produced by such doping
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申请号: US14124004申请日: 2012-03-01
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公开(公告)号: US09692209B2公开(公告)日: 2017-06-27
- 发明人: Jonathan T. Bessette , Yan Cai , Rodolfo E. Camacho-Aguilera , Jifeng Liu , Lionel Kimerling , Jurgen Michel
- 申请人: Jonathan T. Bessette , Yan Cai , Rodolfo E. Camacho-Aguilera , Jifeng Liu , Lionel Kimerling , Jurgen Michel
- 申请人地址: US MA Cambridge
- 专利权人: Massachusetts Institute of Technology
- 当前专利权人: Massachusetts Institute of Technology
- 当前专利权人地址: US MA Cambridge
- 代理商 Theresa A. Lober
- 国际申请: PCT/US2012/027350 WO 20120301
- 国际公布: WO2012/170087 WO 20121213
- 主分类号: H01S3/0941
- IPC分类号: H01S3/0941 ; H01S5/30 ; H01L21/02 ; H01L21/225 ; H01L21/265 ; H01S5/227 ; H01S5/32 ; H01S5/042 ; H01S5/22
摘要:
In a method of forming a photonic device, a first silicon electrode is formed, and then a germanium active layer is formed on the first silicon electrode while including n-type dopant atoms in the germanium layer, during formation of the layer, to produce a background electrical dopant concentration that is greater than an intrinsic dopant concentration of germanium. A second silicon electrode is then formed on a surface of the germanium active layer. The formed germanium active layer is doped with additional dopant for supporting an electrically-pumped guided mode as a laser gain medium with an electrically-activated n-type electrical dopant concentration that is greater than the background dopant concentration to overcome electrical losses of the photonic device.
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