- 专利标题: Multi-pressure MEMS package
-
申请号: US15143762申请日: 2016-05-02
-
公开(公告)号: US09695039B1公开(公告)日: 2017-07-04
- 发明人: Yu-Chia Liu , Chia-Hua Chu , Chun-Wen Cheng , Kuei-Sung Chang , Jung-Huei Peng
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Eschweiler & Potashnik, LLC
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; B81B7/04 ; B81C1/00
摘要:
The present disclosure relates to a microelectromechanical systems (MEMS) package having two MEMS devices with different pressures, and an associated method of formation. In some embodiments, the (MEMS) package includes a device substrate and a cap substrate bonded together. The device substrate includes a first trench and a second trench. A first MEMS device is disposed over the first trench and a second MEMS device is disposed over the second trench. A first stopper is raised from a first trench bottom surface of the first trench but below a top surface of the device substrate and a second stopper is raised from a second trench bottom surface of the second trench but below the top surface of the device substrate. A first depth of the first trench is greater than a second depth of the second trench.
信息查询
IPC分类: