Invention Grant
- Patent Title: Modified product of polyhedral structure polysiloxane, polyhedral structure polysiloxane composition, cured product, and optical semiconductor device
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Application No.: US13823497Application Date: 2011-09-13
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Publication No.: US09698320B2Publication Date: 2017-07-04
- Inventor: Hiroyuki Tanaka , Takao Manabe
- Applicant: Hiroyuki Tanaka , Takao Manabe
- Applicant Address: JP Osaka
- Assignee: KANEKA CORPORATION
- Current Assignee: KANEKA CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Polsinelli PC
- Priority: JP2010-211887 20100922; JP2011-064641 20110323
- International Application: PCT/JP2011/070854 WO 20110913
- International Announcement: WO2012/039322 WO 20120329
- Main IPC: H01L33/56
- IPC: H01L33/56 ; C07F7/21 ; C08G77/50 ; C08G77/00 ; C08K5/3492 ; C08K5/56 ; C08G77/04 ; C08G77/12 ; C08G77/20

Abstract:
An object of the present invention is to provide a polyhedral polysiloxane composition that has high heat resistance and high light resistance, is excellent in gas-barrier properties and thermal shock resistance, and exhibits good handleability when used to encapsulate an optical semiconductor device. The polyhedral polysiloxane composition of the present invention is characterized by including a modified polyhedral polysiloxane which is obtained by hydrosilylation of an alkenyl group-containing polyhedral polysiloxane compound (a) and a hydrosilyl group-containing compound (b) and has a structure derived from an organic silicon compound (a′) having one alkenyl group per molecule.
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