- Patent Title: Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing method
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Application No.: US14632311Application Date: 2015-02-26
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Publication No.: US09708507B2Publication Date: 2017-07-18
- Inventor: Kippei Sugita , Tatsuya Yamaguchi , Yoshinori Morisada , Makoto Fujikawa
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2014-037098 20140227
- Main IPC: C09D179/08
- IPC: C09D179/08 ; H01L21/67 ; C08G73/10 ; C23C16/30 ; C23C16/56 ; H01L21/3105 ; B05D1/00 ; B05D3/02 ; H01L21/3065 ; H01L21/02
Abstract:
A method for improving a chemical resistance of a polymerized film, which is formed on a surface of a target object and to be processed by a chemical, includes: consecutively performing a treatment for improving the chemical resistance of the polymerized film subsequent to formation of the polymerized film within a processing chamber of a film forming apparatus where the polymerized film is formed, without unloading the target object from the processing chamber.
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