Invention Grant
- Patent Title: Semiconductor device having stacked semiconductor chips interconnected via TSV and method of fabricating the same
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Application No.: US14825403Application Date: 2015-08-13
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Publication No.: US09721926B2Publication Date: 2017-08-01
- Inventor: Yeong-Hwan Choe , Tae-Joo Hwang , Tae-Hong Min , Young-Kun Jee , Sang-Uk Han
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse P.C.
- Priority: KR10-2014-0112319 20140827
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L25/00 ; H01L23/48 ; H01L23/00

Abstract:
A semiconductor device includes at least first and second semiconductor chips stacked on each other along a first direction, at least one silicon-through-via (TSV) through at least the first semiconductor chip of the first and second semiconductor chips, a contact pad on the at least one TSV of the first semiconductor chip, the contact pad electrically connecting the TSV of the first semiconductor chip to the second semiconductor chip, and a plurality of dummy pads on the first semiconductor chip, the plurality of dummy pads being spaced apart from each other and from the contact pad along a second direction, and the dummy pads having same heights as the contact pads as measured between respective top and bottom surfaces along the first direction.
Public/Granted literature
- US20160064357A1 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2016-03-03
Information query
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