Invention Grant
- Patent Title: Process for producing fluoride gas
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Application No.: US13057587Application Date: 2009-06-08
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Publication No.: US09731968B2Publication Date: 2017-08-15
- Inventor: Masahide Waki , Tatsuhiro Yabune , Kazuhiro Miyamoto , Kazutaka Hirano
- Applicant: Masahide Waki , Tatsuhiro Yabune , Kazuhiro Miyamoto , Kazutaka Hirano
- Applicant Address: JP Osaka-Shi
- Assignee: STELLA CHEMIFA CORPORATION
- Current Assignee: STELLA CHEMIFA CORPORATION
- Current Assignee Address: JP Osaka-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2008-205991 20080808
- International Application: PCT/JP2009/060417 WO 20090608
- International Announcement: WO2010/016326 WO 20100211
- Main IPC: C01B35/06
- IPC: C01B35/06 ; C01B33/107 ; C01G17/04 ; C01B25/10 ; C01G28/00 ; C01B9/08

Abstract:
Disclosed is a process for producing a fluoride gas that can produces fluoride gases such as BF3, SiF4, GeF4, PF5 or AsF5 at a reduced production cost in a simple manner. The process is characterized in that a compound containing an atom, which, together with a fluorine atom, can form a polyatomic ion, is added to a hydrogen fluoride solution to produce the polyatomic ion in a hydrogen fluoride solution and to evolve a fluoride gas comprising the fluorine atom and the atom that, together with the fluorine atom, can form a polyatomic ion.
Public/Granted literature
- US20110135555A1 PROCESS FOR PRODUCING FLUORIDE GAS Public/Granted day:2011-06-09
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