Invention Grant
- Patent Title: Using tensile mask to minimize buckling in substrate
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Application No.: US14992391Application Date: 2016-01-11
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Publication No.: US09741581B2Publication Date: 2017-08-22
- Inventor: Sunit S. Mahajan , Parul Dhagat , Anne C. Friedman , Timothy A. Brunner , Shahrukh A. Khan
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Hoffman Warnick LLC
- Agent Yuanmin Cai
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L21/308 ; H01L21/306 ; H01L21/8234 ; H01L27/088

Abstract:
A method for preventing buckling in a substrate using a tensile hard mask is provided. The method may include forming a mask over a substrate, the hard mask including a first area having a pattern for forming a plurality of openings and an adjacent second area free of openings, and the hard mask includes a tensile stress therein. The hard mask may be used to form the plurality of openings in the substrate. Partially eroding the hard mask leaves the substrate with the plurality of openings therein and a substantially planar surface, having diminished buckling.
Public/Granted literature
- US20170200614A1 USING TENSILE MASK TO MINIMIZE BUCKLING IN SUBSTRATE Public/Granted day:2017-07-13
Information query
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