公开(公告)号：US20170200614A1

公开(公告)日：2017-07-13

申请号：US14992391

申请日：2016-01-11

Applicant: GLOBALFOUNDRIES INC.

Inventor： Sunit S. Mahajan ,  Parul Dhagat ,  Anne C. Friedman ,  Timothy A. Brunner ,  Shahrukh A. Khan

IPC: H01L21/308 ,  H01L29/06 ,  H01L27/088 ,  H01L21/306 ,  H01L21/8234

CPC classification number: H01L21/3081 ,  H01L21/30604 ,  H01L21/3083 ,  H01L21/3086 ,  H01L21/823431 ,  H01L27/0886 ,  H01L29/0657

Abstract: A method for preventing buckling in a substrate using a tensile hard mask is provided. The method may include forming a mask over a substrate, the hard mask including a first area having a pattern for forming a plurality of openings and an adjacent second area free of openings, and the hard mask includes a tensile stress therein. The hard mask may be used to form the plurality of openings in the substrate. Partially eroding the hard mask leaves the substrate with the plurality of openings therein and a substantially planar surface, having diminished buckling.

公开(公告)号：US09741581B2

公开(公告)日：2017-08-22

申请号：US14992391

申请日：2016-01-11

Applicant: GLOBALFOUNDRIES INC.

Inventor： Sunit S. Mahajan ,  Parul Dhagat ,  Anne C. Friedman ,  Timothy A. Brunner ,  Shahrukh A. Khan

IPC: H01L29/06 ,  H01L21/308 ,  H01L21/306 ,  H01L21/8234 ,  H01L27/088

CPC classification number: H01L21/3081 ,  H01L21/30604 ,  H01L21/3083 ,  H01L21/3086 ,  H01L21/823431 ,  H01L27/0886 ,  H01L29/0657

Abstract: A method for preventing buckling in a substrate using a tensile hard mask is provided. The method may include forming a mask over a substrate, the hard mask including a first area having a pattern for forming a plurality of openings and an adjacent second area free of openings, and the hard mask includes a tensile stress therein. The hard mask may be used to form the plurality of openings in the substrate. Partially eroding the hard mask leaves the substrate with the plurality of openings therein and a substantially planar surface, having diminished buckling.