Invention Grant
- Patent Title: Semiconductor device and method of forming the same
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Application No.: US14924525Application Date: 2015-10-27
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Publication No.: US09748256B2Publication Date: 2017-08-29
- Inventor: Wei-Chang Liu , Zhen Chen , Shen-De Wang , Wang Xiang , Yi-Shan Chiu , Wei Ta
- Applicant: United Microelectronics Corp.
- Applicant Address: TW Hsinchu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Hsinchu
- Agency: J. C. Patents
- Priority: TW104130582A 20150916
- Main IPC: H01L29/788
- IPC: H01L29/788 ; H01L27/11524 ; H01L21/28

Abstract:
Provided is a semiconductor device including a memory gate structure and a select gate structure. The memory gate structure is closely adjacent to the select gate structure. Besides, an air gap encapsulated by an insulating layer is disposed between the memory gate structure and the select gate structure.
Public/Granted literature
- US20170077110A1 SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME Public/Granted day:2017-03-16
Information query
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