Invention Grant
- Patent Title: Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
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Application No.: US14863409Application Date: 2015-09-23
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Publication No.: US09776361B2Publication Date: 2017-10-03
- Inventor: Kasiraman Krishnan , Daniel Redfield , Russell Edward Perry , Gregory E. Menk , Rajeev Bajaj , Fred C. Redeker , Nag B. Patibandla , Mahendra C. Orilall , Jason G. Fung
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: B29C67/00
- IPC: B29C67/00 ; B24B37/22 ; B24B37/26 ; B29K105/16 ; B29L31/00
Abstract:
A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.
Public/Granted literature
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