- 专利标题： Modified novolak phenolic resin, making method, and resist composition
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申请号： US14560358申请日： 2014-12-04
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公开(公告)号： US09777102B2公开(公告)日： 2017-10-03
- 发明人: Yoshinori Hirano , Hideyoshi Yanagisawa
- 申请人： SHIN-ETSU CHEMICAL CO., LTD.
- 申请人地址： JP Tokyo
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2011-233901 20111025; JP2012-176987 20120809
- 主分类号： G03F7/023
- IPC分类号： G03F7/023 ; C08G8/28 ; C08G14/10 ; G03F7/038 ; G03F7/022 ; C08G8/00 ; C08L61/00 ; C08L61/04 ; C08L61/20
摘要：
A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt % of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt % of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application.
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