- 专利标题: Semiconductor layout structure
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申请号: US15092630申请日: 2016-04-07
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公开(公告)号: US09786647B1公开(公告)日: 2017-10-10
- 发明人: Chun-Hsien Huang , Yung-Feng Cheng , Yu-Tse Kuo , Chia-Wei Huang , Li-Ping Huang , Shu-Ru Wang
- 申请人: UNITED MICROELECTRONICS CORP.
- 申请人地址: TW Hsin-Chu
- 专利权人: UNITED MICROELECTRONICS CORP.
- 当前专利权人: UNITED MICROELECTRONICS CORP.
- 当前专利权人地址: TW Hsin-Chu
- 代理商 Winston Hsu
- 主分类号: H01L23/528
- IPC分类号: H01L23/528 ; H01L23/522 ; H01L27/11 ; H01L27/02
摘要:
A semiconductor layout structure includes a substrate comprising a cell edge region and a dummy region abutting thereto, a plurality of dummy contact patterns disposed in the dummy region and arranged along a first direction, and a plurality of dummy gate patterns disposed in the dummy region and arranged along the first direction. The dummy contact patterns and the dummy gate patterns are alternately arranged. Each dummy contact pattern includes an inner dummy contact proximal to the cell edge region and an outer dummy contact distal to the cell edge region, and the inner dummy contact and the outer dummy contact are arranged along a second direction perpendicular to the first direction and spaced apart from each other by a first gap.
公开/授权文献
- US20170294429A1 SEMICONDUCTOR LAYOUT STRUCTURE 公开/授权日:2017-10-12
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