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公开(公告)号:US11475952B2
公开(公告)日:2022-10-18
申请号:US17179418
申请日:2021-02-19
发明人: Chun-Hsien Huang , Yu-Tse Kuo , Shu-Ru Wang , Chun-Yen Tseng , Chun-Chieh Chang
IPC分类号: G11C15/04
摘要: A ternary content addressable memory and a two-port SRAM are provided and include a storage cell and two transistors. The storage cell includes a first active region, a second active region, a third active region, and a fourth active region, extending along a first direction, and a first gate line, a second gate line, a third gate line, and a fourth gate line extending along a second direction. The first gate line crosses the third active region and the fourth active region, the second gate line crosses the fourth active region, the third gate line crosses the first active region, and the fourth gate line crosses the first active region and the second active region. The transistors are electrically connected to the storage cell, and the transistors and the storage cell are arranged along the first direction.
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2.
公开(公告)号:US10892013B2
公开(公告)日:2021-01-12
申请号:US16439680
申请日:2019-06-12
发明人: Chun-Hsien Huang , Ching-Cheng Lung , Yu-Tse Kuo , Shu-Ru Wang , Chun-Yen Tseng
摘要: A two-port ternary content addressable memory (TCAM) and layout pattern thereof, and associated memory device are provided. The two-port TCAM may include a first storage unit, a second storage unit, a set of first search terminals, a set of second search terminals, a first comparison circuit, a second comparison circuit, a first match terminal and a second match terminal, wherein the first comparison circuit is respectively coupled to the first storage unit, the second storage unit, the set of first search terminals and the first match terminal, and the second comparison circuit is respectively coupled to the first storage unit, the second storage unit, the set of second search terminals and the second match terminal. First search data and second search data may be concurrently inputted into the two-port TCAM for determining whether the first search data and the second search data match content data within the two-port TCAM.
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3.
公开(公告)号:US10410684B2
公开(公告)日:2019-09-10
申请号:US15900811
申请日:2018-02-21
发明人: Chun-Yen Tseng , Ting-Hao Chang , Ching-Cheng Lung , Yu-Tse Kuo , Shih-Hao Liang , Chun-Hsien Huang , Shu-Ru Wang , Hsin-Chih Yu
IPC分类号: G11C5/02 , H01L27/108 , H01L27/105 , G11C11/409 , G11C11/419 , H01L27/11 , H01L29/786
摘要: The present invention provides a memory device, the memory device includes a first region having a plurality of oxide semiconductor static random access memories (OSSRAM) arranged in a first direction, and each of the OSSRAMs comprising a static random access memory (SRAM) and at least an oxide semiconductor dynamic random access memory (DOSRAM), wherein the DOSRAM is connected to the SRAM, wherein each of the DOSRAMs comprises an oxide semiconductor gate (OSG), and each of the OSGs extending in a second direction perpendicular to the first direction, and an oxide semiconductor channel extending in the first direction, an oxide semiconductor gate connection extending in the first direction to connect each of the OSGs, and a word line, a Vcc connection line and a Vss connection line extend in the first direction and are connected to the SRAMs in each OSSRAM.
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公开(公告)号:US20180315763A1
公开(公告)日:2018-11-01
申请号:US16028442
申请日:2018-07-06
发明人: Chun-Hsien Huang , Yu-Tse Kuo , Shu-Ru Wang
CPC分类号: H01L27/1108 , H01L21/823431 , H01L21/845 , H01L27/1104 , H01L27/1116 , H01L29/6681 , H01L29/785
摘要: A static random-access memory (SRAM) cell array forming method includes the following steps. A plurality of fin structures are formed on a substrate, wherein the fin structures include a plurality of active fins and a plurality of dummy fins, each PG (pass-gate) FinFET shares at least one of the active fins with a PD (pull-down) FinFET, and at least one dummy fin is disposed between the two active fins having two adjacent PU (pull-up) FinFETs thereover in a static random-access memory cell. At least a part of the dummy fins are removed. The present invention also provides a static random-access memory (SRAM) cell array formed by said method.
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公开(公告)号:US20180286474A1
公开(公告)日:2018-10-04
申请号:US15589985
申请日:2017-05-08
发明人: Chien-Hung Chen , Meng-Ping Chuang , Tong-Yu Chen , Yu-Tse Kuo
IPC分类号: G11C11/406 , G11C11/407
CPC分类号: G11C5/025 , G11C11/412 , H01L27/11 , H01L27/1104
摘要: A semiconductor memory device including a memory cell having a plurality of memory cells, a first P-type well region, a second P-type well region, and an N-type well region disposed between the first P-Type well region and the second P-type well region. The semiconductor memory element defines a plurality of first regions and a plurality of second regions, each of the first regions and each of the second regions including one of the memory cells, each of the second regions further includes at least two first voltage providing contacts, and at least one second voltage providing contact, wherein the first voltage providing contacts and the second voltage providing contact are not located within each first region.
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公开(公告)号:US10050044B2
公开(公告)日:2018-08-14
申请号:US15422471
申请日:2017-02-02
发明人: Li-Ping Huang , Chun-Hsien Huang , Yu-Tse Kuo , Ching-Cheng Lung
IPC分类号: H01L27/11 , H01L27/092 , G11C11/412 , G11C7/14 , G11C11/419 , H01L27/02 , G11C7/22 , H01L27/105 , G11C7/02
CPC分类号: H01L27/1104 , G11C7/02 , G11C7/14 , G11C7/22 , G11C11/4125 , H01L27/02 , H01L27/092 , H01L27/0924 , H01L27/105 , H01L27/1116
摘要: The present invention proposes a static random-access memory device (SRAM). The static random-access memory device is composed of two P-channel gates of loading transistor, two N-channel gates of driving transistor and two N-channel gates of accessing transistor in a memory cell. A dummy gate is disposed adjacent to the N-channel gate of accessing transistor with a bit line node disposed therebetween, wherein the dummy gate is electrically connected to a ground voltage through a metal layer.
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公开(公告)号:US20180006040A1
公开(公告)日:2018-01-04
申请号:US15691764
申请日:2017-08-31
发明人: Chun-Hsien Huang , Yu-Tse Kuo , Shu-Ru Wang
CPC分类号: H01L27/1108 , H01L27/1104 , H01L27/1116 , H01L29/6681 , H01L29/785
摘要: A static random-access memory (SRAM) cell array forming method includes the following steps. A plurality of fin structures are formed on a substrate, wherein the fin structures include a plurality of active fins and a plurality of dummy fins, each PG (pass-gate) FinFET shares at least one of the active fins with a PD (pull-down) FinFET, and at least one dummy fin is disposed between the two active fins having two adjacent PU (pull-up) FinFETs thereover in a static random-access memory cell. At least a part of the dummy fins are removed. The present invention also provides a static random-access memory (SRAM) cell array formed by said method.
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公开(公告)号:US09859282B1
公开(公告)日:2018-01-02
申请号:US15280333
申请日:2016-09-29
发明人: Chun-Yen Tseng , Ching-Cheng Lung , Yu-Tse Kuo , Chun-Hsien Huang , Shu-Ru Wang
IPC分类号: H01L27/108 , H01L29/78
CPC分类号: H01L27/10805 , H01L27/0207 , H01L27/10855 , H01L27/10885 , H01L27/10888
摘要: A high-density semiconductor structure includes a substrate, a bit line and a first memory unit. The bit line, disposed on the substrate, has a first side and a second side. The first memory unit includes a first transistor, a first capacitor, a second transistor and a second capacitor. The first transistor disposed on the substrate has a first terminal and a second terminal. The first terminal connects the bit line. The first capacitor connects the second terminal of the first transistor. The second transistor disposed on the substrate has a third terminal and a fourth terminal. The third terminal connects the bit line. The second capacitor connects the fourth terminal of the second transistor. The first capacitor and the second capacitor are separated from the bit line in a direction perpendicular to an extending direction of the bit line and located on the first side of the bit line.
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公开(公告)号:US09786647B1
公开(公告)日:2017-10-10
申请号:US15092630
申请日:2016-04-07
发明人: Chun-Hsien Huang , Yung-Feng Cheng , Yu-Tse Kuo , Chia-Wei Huang , Li-Ping Huang , Shu-Ru Wang
IPC分类号: H01L23/528 , H01L23/522 , H01L27/11 , H01L27/02
CPC分类号: H01L27/0207 , H01L23/5226 , H01L23/528 , H01L27/1104
摘要: A semiconductor layout structure includes a substrate comprising a cell edge region and a dummy region abutting thereto, a plurality of dummy contact patterns disposed in the dummy region and arranged along a first direction, and a plurality of dummy gate patterns disposed in the dummy region and arranged along the first direction. The dummy contact patterns and the dummy gate patterns are alternately arranged. Each dummy contact pattern includes an inner dummy contact proximal to the cell edge region and an outer dummy contact distal to the cell edge region, and the inner dummy contact and the outer dummy contact are arranged along a second direction perpendicular to the first direction and spaced apart from each other by a first gap.
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公开(公告)号:US09166003B2
公开(公告)日:2015-10-20
申请号:US14062914
申请日:2013-10-25
发明人: Meng-Ping Chuang , Yu-Tse Kuo , Chia-Chun Sun , Yun-San Huang
CPC分类号: H01L29/0692 , H01L27/0207 , H01L27/1104 , H01L29/0684
摘要: A layout configuration for a memory cell array includes at least a comb-like doped region having a first conductivity type and a fishbone-shaped doped region having a second conductivity type. The second conductivity type and the first conductivity type are complementary. Furthermore, the comb-like doped region and the fishbone-shaped doped region are interdigitated.
摘要翻译: 存储单元阵列的布局配置至少包括具有第一导电类型的梳状掺杂区域和具有第二导电类型的鱼骨形掺杂区域。 第二导电类型和第一导电类型是互补的。 此外,梳状掺杂区域和鱼骨形掺杂区域是交错的。
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