Invention Grant
- Patent Title: Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device
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Application No.: US15234489Application Date: 2016-08-11
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Publication No.: US09791777B2Publication Date: 2017-10-17
- Inventor: Akiyoshi Goto , Masafumi Kojima , Michihiro Shirakawa , Keita Kato , Keiyu Ou
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-045583 20140307
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F220/28 ; G03F7/039 ; G03F7/30 ; G03F7/26 ; C08F22/10 ; G03F7/11 ; G03F7/20 ; G03F7/32 ; C08F220/68 ; C08F224/00 ; G03F7/038
Abstract:
The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.
Public/Granted literature
Information query
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