Invention Grant
- Patent Title: Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
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Application No.: US15597906Application Date: 2017-05-17
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Publication No.: US09798235B2Publication Date: 2017-10-24
- Inventor: Hiromi Kobayashi , Haruki Inabe
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-200679 20040707
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/20 ; G03F7/32 ; C07C69/54 ; H01L21/027 ; C08F220/26 ; C08F220/22 ; C08F214/18
Abstract:
A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.
Public/Granted literature
Information query
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