公开(公告)号：US12111487B2

公开(公告)日：2024-10-08

申请号：US17553802

申请日：2021-12-17

Applicant: FUJIFILM Corporation

Inventor： Haruki Inabe

IPC: G02B5/20 ,  C09B47/06 ,  G02B1/04 ,  H01L27/146

CPC classification number: G02B5/208 ,  C09B47/06 ,  G02B1/04 ,  H01L27/14621

Abstract: Provided are a color filter including a colored pixel A including an aluminum phthalocyanine pigment and an ultraviolet absorbing layer which is provided on an optical path on a light incident side of the colored pixel A and has a wavelength region having a transmittance of 20% or less in a wavelength range of 300 to 450 nm, in which a transmittance in a wavelength region of 550 to 800 nm is 80% or more; and a solid-state imaging element and an image display device which include the color filter.

公开(公告)号：US09465292B2

公开(公告)日：2016-10-11

申请号：US15059507

申请日：2016-03-03

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kobayashi ,  Haruki Inabe

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027 ,  C07C69/54

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

公开(公告)号：US09835945B2

公开(公告)日：2017-12-05

申请号：US15359973

申请日：2016-11-23

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kobayashi ,  Shinichi Kanna ,  Haruki Inabe

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/004 ,  G03F7/16 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  G03F7/09

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

公开(公告)号：US09798235B2

公开(公告)日：2017-10-24

申请号：US15597906

申请日：2017-05-17

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kobayashi ,  Haruki Inabe

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  C07C69/54 ,  H01L21/027 ,  C08F220/26 ,  C08F220/22 ,  C08F214/18

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.

公开(公告)号：US09703196B2

公开(公告)日：2017-07-11

申请号：US15252987

申请日：2016-08-31

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kobayashi ,  Haruki Inabe

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C07C69/54 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.

公开(公告)号：US09316912B2

公开(公告)日：2016-04-19

申请号：US14449415

申请日：2014-08-01

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kobayashi ,  Haruki Inabe

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C07C69/54 ,  G03F7/20

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

公开(公告)号：US11746239B2

公开(公告)日：2023-09-05

申请号：US16812611

申请日：2020-03-09

Applicant: FUJIFILM Corporation

Inventor： Shoichi Nakamura ,  Kazuya Ota ,  Haruki Inabe

IPC: C09B56/02 ,  C09B44/10 ,  G02B5/22

CPC classification number: C09B56/02 ,  C09B44/108 ,  G02B5/223

Abstract: A coloring composition includes a metal azo pigment, a compound having an ethylenically unsaturated bonding group, and a solvent, the metal azo pigment includes at least one kind of an anion selected from an azo compound represented by Formula (I) or an azo compound having a tautomeric structure of the azo compound represented by Formula (I), two or more kinds of metal ions, and a melamine compound, and in Formula (I), R1 and R2 each independently represent OH or NR5R6, R3 and R4 each independently represent ═O or ═NR7, and R5 to R7 each independently represent a hydrogen atom or an alkyl group.

公开(公告)号：US09541831B2

公开(公告)日：2017-01-10

申请号：US14638471

申请日：2015-03-04

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kanda ,  Shinichi Kanna ,  Haruki Inabe

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/004

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

Abstract translation: 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用在碱性显影液中具有增强的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; （C）含有选自（x）〜（z）中的至少一种基团的含氟化合物; 和（F）溶剂，以及组合物的图案形成方法：（x）碱溶性基团; （y）通过碱性显影液的作用分解以提高在碱性显影液中的溶解度的基团; 和（z）通过酸的作用分解的基团。

公开(公告)号：US08828643B2

公开(公告)日：2014-09-09

申请号：US13782148

申请日：2013-03-01

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kobayashi ,  Haruki Inabe

IPC: C07C69/54 ,  H01L21/027

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

Abstract translation: 用于液浸暴露的正型抗蚀剂组合物包括：（A）具有单环或多环脂环族烃结构的树脂，所述树脂通过酸作用增加其在碱性显影剂中的溶解度; （B）在用光化射线和辐射之一照射时产生酸的化合物; （C）具有5个以上碳原子的烷基的碱溶性化合物; 和（D）溶剂。