- 专利标题: Light-degradable material, substrate, and method for patterning the substrate
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申请号: US14435342申请日: 2013-10-11
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公开(公告)号: US09822330B2公开(公告)日: 2017-11-21
- 发明人: Takahiro Kishioka , Shigeo Kimura , Yoshiomi Hiroi , Yuki Usui , Hiromi Kitano , Tadashi Nakaji , Makoto Gemmei
- 申请人: NISSAN CHEMICAL INDUSTRIES, LTD. , UNIVERSITY OF TOYAMA
- 申请人地址: JP Tokyo JP Toyama-shi
- 专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.,UNIVERSITY OF TOYAMA
- 当前专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.,UNIVERSITY OF TOYAMA
- 当前专利权人地址: JP Tokyo JP Toyama-shi
- 代理机构: Oliff PLC
- 优先权: JP2012-226380 20121011
- 国际申请: PCT/JP2013/077804 WO 20131011
- 国际公布: WO2014/058061 WO 20140417
- 主分类号: C12M1/00
- IPC分类号: C12M1/00 ; G03F7/075 ; C08F230/08 ; C12M1/12
摘要:
There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanion or a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).
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