Invention Grant
- Patent Title: Cleaning composition after chemical mechanical polishing of organic film and cleaning method using the same
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Application No.: US14942206Application Date: 2015-11-16
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Publication No.: US09845444B2Publication Date: 2017-12-19
- Inventor: Ahn-Ho Lee , Chung-Kyung Jung , Dong-Min Kang , Dong-Hun Kang , Go-Un Kim , Dong-Jin Kim , Yong-Sik Yoo , Young-Chul Jung , Yu-Ri Jung , Jung-Min Choi , Sang-Kyun Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2014-0161215 20141118
- Main IPC: C11D7/50
- IPC: C11D7/50 ; C11D1/00 ; C11D3/20 ; C11D3/30 ; C11D11/00 ; C11D1/66 ; C11D1/72 ; C11D3/28 ; C11D3/43
Abstract:
A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.
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