公开(公告)号：US09845444B2

公开(公告)日：2017-12-19

申请号：US14942206

申请日：2015-11-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ahn-Ho Lee ,  Chung-Kyung Jung ,  Dong-Min Kang ,  Dong-Hun Kang ,  Go-Un Kim ,  Dong-Jin Kim ,  Yong-Sik Yoo ,  Young-Chul Jung ,  Yu-Ri Jung ,  Jung-Min Choi ,  Sang-Kyun Kim

IPC: C11D7/50 ,  C11D1/00 ,  C11D3/20 ,  C11D3/30 ,  C11D11/00 ,  C11D1/66 ,  C11D1/72 ,  C11D3/28 ,  C11D3/43

CPC classification number: C11D1/008 ,  C11D1/662 ,  C11D1/667 ,  C11D1/72 ,  C11D3/2079 ,  C11D3/28 ,  C11D3/30 ,  C11D3/43 ,  C11D11/0047

Abstract: A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.