公开(公告)号：US09885955B2

公开(公告)日：2018-02-06

申请号：US14992061

申请日：2016-01-11

Applicant: Samsung Electronics Co., Ltd. ,  DONGWOO FINE-CHEM

Inventor： Ahn-Ho Lee ,  Seung-Hyun Ahn ,  Jin-Seok Yang ,  Sang-Tae Kim ,  Shi-Jin Sung ,  Kyong-Ho Lee

IPC: G03F7/16 ,  H01L21/31 ,  H01L21/76 ,  H01L21/02 ,  H01L21/311 ,  H01L21/768 ,  H01L21/027

CPC classification number: G03F7/168 ,  G03F7/091 ,  G03F7/162 ,  H01L21/02087 ,  H01L21/0276 ,  H01L21/266 ,  H01L21/31133 ,  H01L21/31144 ,  H01L21/76802

Abstract: A thinner composition including an acetate-based compound in an amount in a range of about 30 weight percent to about 70 weight percent, a lactate-based compound in an amount in a range of about 1 weight percent to about 20 weight percent, a propionate-based compound in an amount in a range of about 30 weight percent to about 60 weight percent, and an ether-based additive in an amount in a range of about 10 ppm to about 500 ppm, based on a total amount of the composition.

公开(公告)号：US09845444B2

公开(公告)日：2017-12-19

申请号：US14942206

申请日：2015-11-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ahn-Ho Lee ,  Chung-Kyung Jung ,  Dong-Min Kang ,  Dong-Hun Kang ,  Go-Un Kim ,  Dong-Jin Kim ,  Yong-Sik Yoo ,  Young-Chul Jung ,  Yu-Ri Jung ,  Jung-Min Choi ,  Sang-Kyun Kim

IPC: C11D7/50 ,  C11D1/00 ,  C11D3/20 ,  C11D3/30 ,  C11D11/00 ,  C11D1/66 ,  C11D1/72 ,  C11D3/28 ,  C11D3/43

CPC classification number: C11D1/008 ,  C11D1/662 ,  C11D1/667 ,  C11D1/72 ,  C11D3/2079 ,  C11D3/28 ,  C11D3/30 ,  C11D3/43 ,  C11D11/0047

Abstract: A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.