Invention Grant
- Patent Title: Photoacid generating polymers containing a urethane linkage for lithography
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Application No.: US13436881Application Date: 2012-03-31
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Publication No.: US09851639B2Publication Date: 2017-12-26
- Inventor: Robert David Allen , Phillip Joe Brock , Masaki Fujiwara , Kazuhiko Maeda , Hoa D. Truong
- Applicant: Robert David Allen , Phillip Joe Brock , Masaki Fujiwara , Kazuhiko Maeda , Hoa D. Truong
- Applicant Address: US NY Armonk JP Ube-shi, Yamaguchi
- Assignee: International Business Machines Corporation,Central Glass Co., Ltd.
- Current Assignee: International Business Machines Corporation,Central Glass Co., Ltd.
- Current Assignee Address: US NY Armonk JP Ube-shi, Yamaguchi
- Agent Michael R. Roberts
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F228/02 ; G03F7/039 ; G03F7/11 ; G03F7/20

Abstract:
A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L′-C(CF3)2(OH). L′ is a divalent linking group comprising at least one carbon and the starred bond of L′ is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.
Public/Granted literature
- US20130260313A1 PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LITHOGRAPHY Public/Granted day:2013-10-03
Information query
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