Invention Grant
- Patent Title: Extreme ultraviolet generation device and exposure system including the same
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Application No.: US15182926Application Date: 2016-06-15
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Publication No.: US09857690B2Publication Date: 2018-01-02
- Inventor: Hoyeon Kim , Jinseok Heo , Insung Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0122022 20150828
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; H05G2/00 ; G02B19/00
Abstract:
An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.
Public/Granted literature
- US20170059998A1 EXTREME ULTRAVIOLET GENERATION DEVICE AND EXPOSURE SYSTEM INCLUDING THE SAME Public/Granted day:2017-03-02
Information query
